RFG-2U

up to 200 MHz/600 W

In combination with our MatchingCubes the RF Generators geeignet für ICP and CCP systems. They are applied in RF Sputtering, Thin Film Coating, PE-CVD, Reactive Ion Etching (RIE) and Substrate Biasing.

The RF Generators of the RFG-2U family are modern and robust. They work with an efficiency of typically 70% or more. A micro controller takes care that the generator operates safe and reliable under any circumstances. Thanks to the touch panel at the front you can control the RF generator with overview and convenience. You can control the RF Generator also via its serial interface.

A software is included in the shipment.

RF Power Accuracy:+- 3% / 3WCooling:Forced Air
Load Impedance:50 OhmsMains Power:90 – 240V / 50 Hz
Harmonic DistortionRF Output:N
Pulse Frequency:20 kHz max.Remote Control RS-232:Sub-D9
Pulse Length:50 – 9949 usec.MatchingCube:Sub-D9
Ignition:Interlock:Sub-D9
Ambient Temperature:10 – 35°CAnalog Interface:Sub-D25

Art.No.ProductFrequency [MHz]Power [W]
198060RFG-13-100-L13.56100
198200RFG-27-100-L27.12100
198220RFG-40-100-L40.68100
198320RFG-2-300-L2300
198300RFG-13-300-L13.56300
198310RFG-27-300-L27.12300
198330RFG-40-300-L40.68300
198340RFG-54-300-L54.24300
198350RFG-60-300-L60300
198360RFG-80-300-L80300
198370RFG-81-300-L81.36300
198380RFG-100-300-L100300
198510RFG-13-600-L13.56600

Other models are available upon request.