In combination with our RF Generators the MatchingCube geeignet für ICP and CCP systems. They are applied in RF Sputtering, Thin Film Coating, PE-CVD, Reactive Ion Etching (RIE) and Substrate Biasing.
The MatchingCubes take care for matching condition, that is the power transport from the RF Generator to the plasma system. For small RF power levels they employ variable air gap capacitors, for large RF power levels variable vacuum capacitors. The MatchingCubes MCi und MCii can work broadband. For broadband appliations they form an optimum team with our broadband RF Generators. You can control the MatchingCubes either via its serial interface or with a barthel RF Generator. A software is included in the shipment.
|RF Power (typ)||300||600||300||2000||1000||2000||W|
|Input Connector||N||N||N||N (HV)||N||N (HV)|
|Output Connector||N||N or 7/16||N||copper strap||copper strap||copper strap|
|Art.No.||Product||Frequency [MHz]||Power [W]||Remarks|
Other models are available upon request.