MatchingCube

 

In combination with our RF Generators the MatchingCube geeignet für ICP and CCP systems. They are applied in RF Sputtering, Thin Film Coating, PE-CVD, Reactive Ion Etching (RIE) and Substrate Biasing.  

The MatchingCubes take care for matching condition, that is the power transport from the RF Generator to the plasma system. For small RF power levels they employ variable air gap capacitors, for large RF power levels variable vacuum capacitors. The MatchingCubes MCi und MCii can work broadband. For broadband appliations they form an optimum team with our broadband RF Generators. You can control the MatchingCubes either via its serial interface or with a barthel RF Generator. A software is included in the shipment.

 MCi-300MCi-600MCiiMCiiiMCivMCv 
Frequency Range10-5010-2050-10010-5013.5613.56MHz
Bandwidthnarrow/broadnarrow/broadnarrow/broadnarrownarrownarrow
RF Power (typ)300600300200010002000W
Input ConnectorNNNN (HV)NN (HV)
Output ConnectorNN or 7/16Ncopper strapcopper strapcopper strap
Dimensions H/W/D190x190x300190x190x300190x190x300220x210x300114x170x206130x260x335mm

Art.No.ProductFrequency [MHz]Power [W]Remarks
210052MCi-30010-50300
210053MCi-60010-20600
210055MCi-600-7/1610-20600output: 7/16
210062MCii50-100300
210100MCiii13.562000
210190MCiv13.561000no inductor
210200MCv13.562000no inductor

Other models are available upon request.