various frequencies / up to 2000W
The models of the MatchingCube – S – Series stand out with a very compact design. They come without an internal coil. In combination with our RF Generators the MatchingCubes of the S-Series are therefore especially suitable for ICP systems. They are applied in RF Sputtering, Thin Film Coating, PE-CVD, Reactive Ion Etching (RIE) and Substrate Biasing.
The MatchingCubes take care of good matching conditions. This allows the RF Generator to deliver the power to the plasma system. The MatchingCubes of the S-Series employ variable vacuum capacitors. Due to the compact cabinet the MatchingCube – S – are suitable to equip older plasma systems with a new and modern match. You can control the MatchingCubes either via its serial interface. A remote control software is included in the shipment. This software allows to set control parameters and to define application profiles. This ensures optimum results for your application.
|– S1 –||– S2 –|
|Frequency||13.56 et al.||13.56 et al.||MHz|
|RF Power (typ)||1000||2000||W|
|Configuration||L / Gamma||L / Gamma|
|AutoMatch||PM / PR||PM/PR|
|Input Connector||N||N (HV)|
|Output Connector||Copper strap / 7/16||Copper strap / 7/16|
The models of the MatchingCube – S – Series are available with two configurations. Which circuit configuration – L or Gamma – works best depends greatly on the load impedance of the plasma application. Models with other working frequencies we can realize upon request. For the AutoMatch functionality the MatchingCube – S – models employ a phase-magnitude detector (PM). Upon request a directional coupler (PR) can be used instead. Certainly, we assist you in determining the optimum solution for your application.
|Art.No.||Product||Frequency [MHz]||Power [W]||Remarks|
Other models are available upon request.