In combination with our RF Generators the MatchingCubes of the A-Series are fitting for ICP and CCP systems. They are applied in RF Sputtering, Thin Film Coating, PE-CVD, Reactive Ion Etching (RIE) and Substrate Biasing.
The MatchingCubes take care of good matching conditions. This allows the RF Generator to deliver the power to the plasma system. The MatchingCubes of the A-Series employ variable air gap capacitors. The MatchingCubes – A – can work broadband. For broadband application they form an optimum team with our broadband RF Generators. You can control the MatchingCubes either via its serial interface or with a barthel RF Generator. A remote control software is included in the shipment. This software allows to set control parameters and to define application profiles. This ensures optimum results for your application.
|Frequency||10-100||2/13.56/27.12/40.68 et al.||MHz|
|RF Power (typ)||300/600||300/600||W|
|Output Connector||N||N/7/16/Copper strap|
The narrowband models of the MatchingCube A-Series are available with three configurations and with a freely chosen working frequency. Which circuit configuration – L, T, or Gamma – works best depends greatly on the load impedance of the plasma application. For the AutoMatch functionality the broadband MatchingCube models employ a directional coupler (PR) while the narrowband MatchingCube models employ a phase-magnitude detector (PM). Certainly, we assist you in determining the optimum solution for your application.
|Art.No.||Product||Frequency [MHz]||Power [W]||Remarks|
Other models are available upon request.