In combination with our MatchingCubes the Low Frequency Generators geeignet für ICP and CCP systems. They are applied in Etching, Dielectric Sputtering, PE-CVD, Substrate Biasing, Plasma Polymer Processing and DLC Coating.

The Low Frequency Generators are modern and robust. They provide the frequency as additional parameter so that you have another degree of freedom to optimize your application. A micro controller takes care that the generator operates safe and reliable under any circumstances. Thanks to the touch panel at the front you can control the RF generator with overview and convenience. You can control the RF Generator also via its serial interface. A software is included in the shipment.

RF Power Accuracy:+- 3% / 3WCooling:Forced Air
Load Impedance:50 OhmsMains Power:90 – 240V / 50 Hz
Harmonic DistortionRF Output:N
Pulse Frequency:20 kHz max.Remote Control RS-232:Sub-D9
Pulse Length:50 – 9949 usec.MatchingCube:Sub-D9
Ambient Temperature:10 – 35°CAnalog Interface:Sub-D25

Power [W]40-80 kHz80-160 kHz160-300 kHz300-500 kHz

Other models are available upon request.